TECHNOLOGY/BUSINESS OPPORTUNITY Closed Loop Arbitrary Spatial Polarization Shaping (CLASPS)
Energy, Department of · ENERGY, DEPARTMENT OF
- Response deadline
- Aug 13, 2026, 1:00 PM EDT
- Posted
- Jul 13, 2026
- Solicitation
- 2025-185
- Set-aside
- None listed
- PSC
- —
- Place of performance
- Livermore, CA, USA
- Contracting office
- LLNS � DOE CONTRACTOR · Livermore · CA
- Source
- SAM.gov · updated Jul 13, 2026
Description
Opportunity: Lawrence Livermore National Laboratory (LLNL), operated by the Lawrence Livermore National Security (LLNS), LLC under contract no. DE-AC52-07NA27344 (Contract 44) with the U.S. Department of Energy (DOE), is offering the opportunity to enter into a collaboration to further develop and commercialize its Closed Loop Arbitrary Spatial Polarization Shaping (CLASPS). Background: High-energy and high-peak-power pulsed laser systems are enabling technologies for particle acceleration, nuclear fusion, additive manufacturing, defense and more. Newer laser systems continually push the limits of laser pulse energy and peak power to drive stronger laser-matter interactions. There is a pressing need for tighter customization of pulse shaping and tunable polarization in applications such as particle acceleration and coupling laser pulse energy to EUV source materials for increased yield of relevant particles/radiation. Description: Performance at bottlenecks of these high energy laser systems can be enhanced by careful manipulation of the laser pulse and laser beam qualities using CLASPS. This enables spatial phase and polarization laser shaping, which can address dynamic thermal birefringence and accumulation of other nonideal optical aberrations that make it difficult to control laser beam wavefronts. Advantages/Benefits: Much lower costs vs. deformable mirror wavefront shapers Much higher laser damage threshold wavefront shaping component technology Potential Applications: Polarization/Wavefront shaping for damage-free operation of IFE class laser drivers, high peak power laser based particle accelerators Key enabling technology for higher EUV photon yield EUV and beyond EUV laser drivers for high throughput semiconductor patterning and manufacture. Development Status: Current stage of technology development: TRL ? 0-2 ? 3-5 ? 5-9 LLNL has filed for patent protection on this invention. LLNL is seeking industry partners with a demonstrated ability to bring such inventions to the market. Moving critical technology beyond the Laboratory to the commercial world helps our licensees gain a competitive edge in the marketplace. All licensing activities are conducted under policies relating to the strict nondisclosure of company proprietary information. Please visit the IPO website at https://ipo.llnl.gov/resources for more information on working with LLNL and the industrial partnering and technology transfer process. Note: THIS IS NOT A PROCUREMENT. Companies interested in commercializing LLNL's Closed Loop Arbitrary Spatial Polarization Shaping (CLASPS) should provide an electronic OR written statement of interest, which includes the following: Company Name and address. The name, address, and telephone number of a point of contact. A description of corporate expertise and/or facilities relevant to commercializing this technology. Please provide a complete electronic OR written statement to ensure consideration of your interest in LLNL's Closed Loop Arbitrary Spatial Polarization Shaping (CLASPS). The subject heading in an email response should include the Notice ID and/or the title of LLNL�s Technology/Business Opportunity and directed to the Primary and Secondary Point of Contacts listed below. Written responses should be directed to: Lawrence Livermore National Laboratory Innovation and Partnerships Office P.O. Box 808, L-779 Livermore, CA 94551-0808 Attention: 2025-185
What similar awards have paid
Real federal awards already on the books in a similar lane — so you can size the opportunity, not guess. This is public history, not a bid price, cost estimate, or prediction that you will win.
Typical award size
$67,319
Middle of the pack for similar past awards
Most similar awards fall between $22,052 and $110,292
Who has won work like this
Public awardees in this lane — useful for competitor scan or teaming ideas, not a ranked list of “best” firms.
- 1SPECTRA SYSTEMS CORPORATION1 award$2.00M
- 2MATRIX INDUSTRIES INC1 award$1.55M
- 3STERILIZ, LLC9 awards$764,401
- 4CAMBRIDGE TERAHERTZ INC1 award$749,976
- 5FINETECH1 award$628,110
- 6KURT J LESKER CO1 award$520,650
- 7SUSS MICROTEC INC1 award$417,621
- 8TRU-D SMARTUVC, LLC5 awards$398,940
Drawn from official USAspending contract records in our index. Always confirm requirements on the SAM.gov notice before you bid.
Intelligence only — not legal advice or a guarantee of award. Always verify requirements on the official SAM.gov notice. Past award amounts are public history, not a suggested bid or prediction. Notice ID cc6e4b8f2ae843609784bc41117d088a.